National Technical University of Athens
School of Chemical Engineering
@research & funding


Based on the continuum modelling of complicated chemical engineering processes involving simultaneous transport of momentum, heat and mass and chemical reactions, recent and current investigations include:

  • Computational and experimental analysis of chemical vapor deposition processes. This is collaborative research with Dr. C. Vahlas at CIRIMAT/ ENSIACET, Toulouse, France. Partially funded by OSRAM Opto Semiconductors GmbH (Regensburg, Germany) and MECANO I&D (Toulouse, France).

  • Modelling of plasma processes aiming at the development of an integrated, self-consistent simulator, accounting for plasma physics and surface and bulk chemistry. The simulator is applied to the etching and deposition of mainly SiO2 and Si in fluorocarbon plasma reactors. The main efforts focus on the integration of the simulator with a profiler of micro-etched surfaces.
    This is collaborative research with Dr. E. Gogolides and Dr. G. Kokkoris at the Institute of Nanoscience and Nanotechnology of the National Center for Scientific Research “Demokritos”.




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